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How to Stop Transistors from Wearing Out in Radio Frequency Chips

A method for extending the lifespan of silicon-on-insulator transistors by using a special sink to drain away charge that causes gate oxide breakdown.

Granted 2022ActiveExpires 2039Owned by PSemi CorpInvented by Tae Youn Kim, Christopher N. Brindle, Michael A. Stuber + 6 more

Original patent title: “USRE48965E1 - Method and apparatus improving gate oxide reliability by controlling accumulated charge

Plain-English explanation by SahiLast reviewed · June 15, 2026

A method for extending the lifespan of silicon-on-insulator transistors by using a special sink to drain away charge that causes gate oxide breakdown. Granted to PSemi Corp in 2022 with 110 claims.

Key facts

Patent numberUS RE48965
StatusActive
FieldSemiconductors & Chips
AssigneePSemi Corp
InventorsTae Youn Kim, Christopher N. Brindle, Michael A. Stuber and 6 others
Filed2019
Granted2022
Claims110
Times cited0
LitigationNone on record
Value · $50K$161KModest

Coverage

What does this patent actually cover?

This patent describes a technique to prevent the premature failure of transistors used in radio frequency (RF) switches. When transistors are built on a silicon-on-insulator (SOI) substrate, they can accumulate unwanted electrical charge in their body, which stresses the thin gate oxide layer and leads to time-dependent dielectric breakdown (TDDB). The invention adds an 'accumulated charge sink' (ACS) to the transistor body. By applying a negative bias voltage to this sink, the system actively removes the accumulated charge, keeping the gate oxide healthy and extending the life of the device.

The gap

What does this patent NOT cover?

  • Does not cover standard bulk silicon MOSFETs that do not use an SOI substrate.
  • Does not cover charge control methods that rely solely on positive bias voltages.
  • Does not cover transistors lacking a dedicated body contact or sink for charge removal.

These exclusions are unique to PatentBrief — derived from the actual claim language, not patent-office boilerplate.

What made this novel

The innovation lies in recognizing that the 'body' of an SOI transistor is electrically floating, which allows charge to build up and degrade the oxide. By providing a controlled path to drain this charge using a negative bias, the inventors turned a parasitic effect into a manageable circuit parameter.

USRE48965E1 - Method and appar…(Primary claim)semiconductorstelecommunicationsconsumer electronics

Schematic visualization of the patent's claim structure. Hand-drawn diagrams in progress for each landmark patent.

Where you've seen this

Real-world examples

01

RF front-end modules in 4G and 5G smartphones

02

High-performance antenna switches

03

SOI-based power amplifiers

Why it matters

The bigger picture

RF switches are essential components in modern smartphones and wireless hardware, allowing devices to toggle between different frequency bands. As these devices shrink, the gate oxide layers in transistors become thinner and more prone to failure. This technology is critical for ensuring that high-performance RF front-end modules remain reliable over the multi-year lifespan of a consumer device.

Filed

December 11, 2019

Granted

March 8, 2022

Market context

Who's building on this

Companies in this space

PSemi Corporation (formerly Peregrine Semiconductor) is the primary developer of this technology. Their SOI-based RF switch designs are foundational to the industry, and they continue to refine these charge control techniques for increasingly dense 5G radio frequency modules.

Market impact

This technology enabled the transition of RF switches from traditional silicon-on-sapphire to more cost-effective and scalable silicon-on-insulator processes. It effectively solved a major reliability bottleneck, allowing manufacturers to pack more switches into smaller spaces without sacrificing the longevity of the device.

Claim 1 — Plain English

What this patent covers

This patent describes a technique to prevent the premature failure of transistors used in radio frequency (RF) switches. When transistors are built on a silicon-on-insulator (SOI) substrate, they can accumulate unwanted electrical charge in their body, which stresses the thin gate oxide layer and leads to time-dependent dielectric breakdown (TDDB). The invention adds an 'accumulated charge sink' (ACS) to the transistor body. By applying a negative bias voltage to this sink, the system actively removes the accumulated charge, keeping the gate oxide healthy and extending the life of the device.

The clever bit

The innovation lies in recognizing that the 'body' of an SOI transistor is electrically floating, which allows charge to build up and degrade the oxide. By providing a controlled path to drain this charge using a negative bias, the inventors turned a parasitic effect into a manageable circuit parameter.

What it does not cover

  • Does not cover standard bulk silicon MOSFETs that do not use an SOI substrate.
  • Does not cover charge control methods that rely solely on positive bias voltages.
  • Does not cover transistors lacking a dedicated body contact or sink for charge removal.

Patent timeline

Filing

Application submitted to the patent office

Publication

Application published, typically 18 months after filing

Grant

Patent officially issued

PatentBrief Score

Impact Score

Moderate

Citation count

0/40

No citations yet

Claim breadth

20/20

Very broad protection

Recency

20/20

Granted within 5 years

Assignee scale

0/20

Independent or smaller assigneeassigneeThe entity that owns the patent — usually the inventor's employer or a company.Read more →

PatentBrief Impact Score — based on citation count, claim breadth, recency, and assignee scale. Not a legal assessment.

Heuristic Value Estimate

What this patent might be worth

Modest

$50K$161K

Midpoint $101K · 13.5 yr remaining · industry ×1.4

Adjust inputs →

Heuristic only — blends forward/backward citation counts, claim scope, time remaining, litigation history, and CPC-derived industry baseline. Real valuations need a professional appraisal.

The original legal language

Original claims

110 claims as filed with the patent office.

Concepts involved

ClaimPrior artNon-obviousnessNoveltySpecificationAssigneePatent term

Citations

Patent lineage

Cites earlier patents

781

earlier patents this invention cites as foundations

View prior art →

Cite this patent

Kim, T. Y., Brindle, C. N., Stuber, M. A., Kelly, D. J., Imthurn, G. P., Dribinsky, A., Kemerling, C. L., Welstand, R. B., & Burgener, M. L. (2022). How to Stop Transistors from Wearing Out in Radio Frequency Chips (U.S. Patent No. RE48,965). U.S. Patent and Trademark Office. https://patentbrief.org/patent/us/RE48965/google-play-store

Auto-generated from the patent record. Double-check author order and the issue date against the official USPTO document before submitting.

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Common Questions

Frequently Asked Questions

What does How to Stop Transistors from Wearing Out in Radio Frequency Chips cover?

A method for extending the lifespan of silicon-on-insulator transistors by using a special sink to drain away charge that causes gate oxide breakdown.

Who owns patent US RE48965?

PSemi Corp owns this patent, granted in 2022.

When does this patent expire?

This patent is expected to expire on March 8, 2042, when the invention enters the public domain.

What problem does this patent solve?

RF switches are essential components in modern smartphones and wireless hardware, allowing devices to toggle between different frequency bands. As these devices shrink, the gate oxide layers in transistors become thinner and more prone to failure. This technology is critical for ensuring that high-performance RF front-end modules remain reliable over the multi-year lifespan of a consumer device.

What does this patent NOT cover?

Does not cover standard bulk silicon MOSFETs that do not use an SOI substrate.

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Last reviewed: June 15, 2026 · PatentBrief is not a law firm and this is not legal advice.