PatentBrief

Gas-phase chemical reactor and method of using same

A gas-phase chemical reactor, a system including the reactor, and methods of using the reactor and system are disclosed. An exemplary reactor includes a reaction chamber and is configured to provide a precursor within th…

Granted 2026activeExpires 2042Owned by ASM IP HOLDING BVInvented by NISKANEN ANTTI JUHANI

Original patent title: “Gas-phase chemical reactor and method of using same

What this patent covers

The actual claim

A gas-phase chemical reactor, a system including the reactor, and methods of using the reactor and system are disclosed. An exemplary reactor includes a reaction chamber and is configured to provide a precursor within the reaction chamber for a soak period—e.g., a period wherein a supply of the precursor to the reaction chamber is ceased and before purging of the reaction chamber begins. This allows relatively high residence times, relatively high partial pressures of the precursor(s) and/or a relatively high absolute pressure to be obtained within the reaction chamber during substrate processing.

What this patent does NOT cover

The boundaries

    These exclusions are unique to PatentBrief — derived from the actual claim language, not patent-office boilerplate.

    Gas-phase chemical reactor and…(Primary claim)

    Schematic visualization of the patent's claim structure. Hand-drawn diagrams in progress for each landmark patent.

    Patent Abstract

    Patent abstract

    A gas-phase chemical reactor, a system including the reactor, and methods of using the reactor and system are disclosed. An exemplary reactor includes a reaction chamber and is configured to provide a precursor within the reaction chamber for a soak period—e.g., a period wherein a supply of the precursor to the reaction chamber is ceased and before purging of the reaction chamber begins. This allows relatively high residence times, relatively high partial pressures of the precursor(s) and/or a relatively high absolute pressure to be obtained within the reaction chamber during substrate processing.

    Patent Journey

    From filing to today

    Patent Filed

    2022

    Patent Granted

    2026 · 4yr after filing

    Active Today

    2026

    Highly Cited

    10,052 patents cite this

    Expires

    2042

    PatentBrief Score

    Impact Score

    60/ 100

    Strong

    Citation count

    40/40

    Highly cited

    Claim breadth

    0/20

    Narrow claims

    Recency

    20/20

    Granted within 5 years

    Assignee scale

    0/20

    Independent or smaller assignee

    PatentBrief Impact Score — based on citation count, claim breadth, recency, and assignee scale. Not a legal assessment.

    Claim text not yet imported for this patent.

    Citations

    Patent lineage

    Cited by later patents

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    Gas-phase chemical reactor and method of using same — Patent US 12516413 | PatentBrief