# Making Tiny Microchips with Gas-Infused Dry Resist

> This patent describes a way to make incredibly tiny features on microchips by using a special gas to treat a 'dry resist' material, making it sensitive to extreme ultraviolet light, and then recovering unused materials.

- **Patent:** US 12736874
- **Original title:** Apparatus and process for EUV dry resist sensitization by gas phase infusion of a sensitizer
- **Granted:** 2026
- **Status:** Active
- **Times cited:** 0
- **Field:** semiconductors, materials, manufacturing, consumer_electronics

## What it does

This technology focuses on creating very small patterns on semiconductor wafers, a crucial step in making microchips. It involves a 'stack' that includes a 'sensitized resist film.' Instead of using liquid chemicals, a 'sensitizer' is delivered in a 'gas form' to infuse the dry resist, making it reactive to 'EUV' light. A key part of the process is recovering any 'unreacted sensitizer precursors' after the deposition step, which can reduce waste and cost. For example, a silicon wafer coated with a dry resist could be placed in a chamber, and a sensitizer gas flowed over it to prepare the resist for patterning with EUV light.

## What it does NOT cover

- Does not cover liquid-based methods for applying sensitizers to resist films.
- Does not cover 'wet resist' processes where the resist itself is applied as a liquid solution.
- Does not cover lithography techniques that do not use Extreme Ultraviolet (EUV) light.
- Does not cover methods that do not include a step for recovering unreacted sensitizer precursors.
- Does not cover resist films that are not 'dry resists' or are not sensitized by gas phase infusion.

## The clever bit

The novelty lies in using a sensitizer in gas form to infuse a dry resist, rather than traditional liquid-based methods. This approach allows for precise control and the clever addition of recovering unreacted sensitizer precursors, which minimizes waste and improves process efficiency.

## Real-world examples

1. Advanced microprocessors in smartphones
2. High-density memory chips (DRAM, NAND)
3. Graphics processing units (GPUs)
4. Specialized AI accelerators
5. Modern semiconductor manufacturing foundries

## Why it matters

This patent addresses a critical challenge in semiconductor manufacturing: making ever-smaller features on microchips. Extreme Ultraviolet (EUV) lithography is essential for producing the most advanced processors and memory chips. Improving the resist materials and their application, especially through dry processes and material recovery, can lead to more efficient, cost-effective, and environmentally friendly chip production, directly impacting the performance and price of consumer electronics.

## Frequently asked questions

### What does Making Tiny Microchips with Gas-Infused Dry Resist cover?

This patent describes a way to make incredibly tiny features on microchips by using a special gas to treat a 'dry resist' material, making it sensitive to extreme ultraviolet light, and then recovering unused materials.

### When does this patent expire?

This patent is expected to expire on September 15, 2046, when the invention enters the public domain.

### What problem does this patent solve?

This patent addresses a critical challenge in semiconductor manufacturing: making ever-smaller features on microchips. Extreme Ultraviolet (EUV) lithography is essential for producing the most advanced processors and memory chips. Improving the resist materials and their application, especially through dry processes and material recovery, can lead to more efficient, cost-effective, and environmentally friendly chip production, directly impacting the performance and price of consumer electronics.

### What does this patent NOT cover?

Does not cover liquid-based methods for applying sensitizers to resist films.

**Full plain-English explainer:** https://patentbrief.org/patent/us/12736874/apparatus-and-process-for-euv-dry-resist-sensitization-by-gas-phase-infusion-of

**Original patent:** https://patents.google.com/patent/US12736874

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_Source: PatentBrief — https://patentbrief.org. Patent facts are from public records; the plain-English explanation is PatentBrief's._