# Li-Yen Lin — Patents explained on PatentBrief

Li-Yen Lin has 1 landmark patent explained in plain English on PatentBrief.

- [Making Microchips with a Silicon-Containing Photoresist Layer](https://patentbrief.org/patent/us/10281819/silicon-containing-photoresist-for-lithography) — granted 2019
  This patent describes a method for precisely creating tiny patterns on microchips using a special light-sensitive material, called a photoresist, that contains silicon and changes its properties when exposed to light.

**Full profile:** https://patentbrief.org/inventor/li-yen-lin

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_Source: PatentBrief — https://patentbrief.org. Plain-English explanations of US patents._