# Ching-Yu Chang — Patents explained on PatentBrief

Ching-Yu Chang has 3 landmark patents explained in plain English on PatentBrief.

- [How to Clean Metal Off Wafers After EUV Chipmaking](https://patentbrief.org/patent/us/20250172879/metal-compound-removing-solvent-and-method-in-lithography)
  This patent describes a specialized system and cleaning fluid used to precisely remove tiny metal bits from silicon wafers after they've been patterned using extreme ultraviolet light for making advanced computer chips.
- [How to Clean Tiny Chip Patterns Using a Special Chemical Developer](https://patentbrief.org/patent/us/10866511/extreme-ultraviolet-photolithography-method-with-developer-composition) — granted 2020
  This patent describes a method for making advanced computer chips using extreme ultraviolet light and a special chemical developer that cleans away tiny metal leftover bits from the chip's patterns.
- [Making Microchips with a Silicon-Containing Photoresist Layer](https://patentbrief.org/patent/us/10281819/silicon-containing-photoresist-for-lithography) — granted 2019
  This patent describes a method for precisely creating tiny patterns on microchips using a special light-sensitive material, called a photoresist, that contains silicon and changes its properties when exposed to light.

**Full profile:** https://patentbrief.org/inventor/ching-yu-chang

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_Source: PatentBrief — https://patentbrief.org. Plain-English explanations of US patents._