# Chin-Hsiang Lin — Patents explained on PatentBrief

Chin-Hsiang Lin has 1 landmark patent explained in plain English on PatentBrief.

- [How to Clean Tiny Chip Patterns Using a Special Chemical Developer](https://patentbrief.org/patent/us/10866511/extreme-ultraviolet-photolithography-method-with-developer-composition) — granted 2020
  This patent describes a method for making advanced computer chips using extreme ultraviolet light and a special chemical developer that cleans away tiny metal leftover bits from the chip's patterns.

**Full profile:** https://patentbrief.org/inventor/chin-hsiang-lin

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_Source: PatentBrief — https://patentbrief.org. Plain-English explanations of US patents._